• • MYT Series Diffusion Furnace

  • ---

  • 2~12"水平式爐管
  • PROCESS
  • OXIDE 氧化層
  • PRE-DEP 預沉積

         1.Solid source Doping:BORON

         2.Liquid source Doping:POCL3

  • Drive in 驅入
  • Forming gas anneal 退火
  • Alloy 合金
  • Sinter 燒結
  • LTO
  • Nitride
  • POLY
  • Sipos
  • Purify 有機物純化

PCT-CRS-150

PCT-CRS-150 is PicoTrack’s latest development that offers the most advantages.

With a flexible configuration, it easily adapts too many kinds of lithography process such as MEMs, IC, LED, etc.

Offers in one tool a capacity up to 4 spin modules,6 Hotplates and dual robot arms for wafer handling yielding the highest throughput and smallest foot print.

High quality design using open commercial part that easily facilitates spare parts management by end users.

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Canon PLA-501

aligner system test on machine

PCB repair ; GAP unit overhaul; microscope lamp modify to fiber…etc

Canon PLA-501 aligner system overhaul.

KLA . P11 Profiler

Contact Surface Profiler

Rev. 4.2 Software

MicroHead IIsr Head Assy.

8"-wafer or below sample size

0.5A (0.002min.) Resolution

Vertical range up to 300μm

MYT HMDS OVEN

MYT HMDS OVEN DESIGN BY MYT ,

HIGH THROUPUT HMDS OVEN

Wafer Expander

After cutting the grain, the grain spacing on the film increased.

Precision PID temperature control, heated surface temperature uniformity.

Automatically locking cover.

A preheating time function.

Set up a digital caliper instructions easy to adjust the cylinder stroke.

Film automatically cut off.

Manual machine can be used for micro-expansion.

SpinDryer

Quick ramp DC drive motor, centrifugal drying, and heated nitrogen dry combine

to remove water and latent moisture economically and efficiently.

Increases the capacity to rinse and dry 50 wafers (two cassettes) in a single chamber.

Increases throughput while minimizing fab floor space.

Ultra-clean process. Accommodates up to 200mm round media or wafers.

Vacuum Packaging